CATALYST Engineering Services, Inc


KLA 2XX Defect Inspection System
Maintenance and Repair

Contact:  support @ catalystesi.com



KLA 2XX Defect Inspection System Description
   The KLA 2XX defect inspection system checks computer chip patterns for defects, much as one would do with a photograph negative before making many prints.  A typical plate (photomask) has several rows and columns (an array) of identical chip patterns (could be compared to maps with roads connecting islands) formed by chrome plating on a glass surface.  Detection criteria assumes a photomask will not have a similar defect in the same location in two die (of the array) as it optically compares two die while scanning.  The system scans the photomask, and stores defect locations for a human operator to review and classify - classification data is stored in an intermediate computer and sent to a Defect Repair Station for an operator to make repairs.
    Parts and service information for this series are available from Catalyst.


Lo res  53K
Hi res  1.08M


Lo res  75K
Hi res  1.00M



Lo res  90K
Hi res  585K



Lo res  82K
Hi res  1.06M



Lo res  70K
Hi res  738K



Lo res  37K
DuPont Verimask(TM) 345 test pattern


KLA-20 / RIA with KLARIS tape drive and ethernet alternative using Arraid TES-2 emulators (a separate TES unit is needed to write files).  The unit below also uses the AEM-1 SMD disk drive emulator:
   540MB Magneto Optical disks hold approximately 45 11" tape reels (1600bpi)
   No fast forward or rewind delays
   KLA Inspection system can scan directly from TES-2 using "Scan From Tape" option
   Much faster write time from CATS / faster download to RIA hard disk
   Multiple inspection files can be written to a single MO disk with CATS software


Support and experience outlined in Background information